The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 1997

Filed:

May. 25, 1995
Applicant:
Inventors:

Ronald E Bambury, Fairport, NY (US);

David E Seelye, Rochester, NY (US);

Assignee:

Bausch & Lomb Incorporated, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526279 ; 526245 ; 526286 ; 526301 ; 526314 ;
Abstract

Novel monomers of the general formula ##STR1## where b is 0 or 1, a is 1, 2, 3 or 4, R.sup.2 is a monovalent alkyl radical and R is an organic radical. The novel monomers may be employed to produce novel copolymers useful as hydrogel, soft non-hydrogel and/or rigid gas permeable contact lens materials.


Find Patent Forward Citations

Loading…