The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 1997

Filed:

May. 02, 1995
Applicant:
Inventors:

Sheau-Hwa Ma, Chaddsford, PA (US);

Walter R Hertler, Kennett Square, PA (US);

Howard E Simmons, III, Wilmington, DE (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427264 ; 427273 ; 427353 ;
Abstract

A method for preparing high resolution wash-off polyimide images is described having the sequential steps of (a) providing a non-photosensitive layer containing a substantially non-crystalline poly(amic acid) polymer or salt thereof on a substrate; (b) applying an aqueous ink imagewise to the non-photosensitive layer to change the solubility in the ink-applied areas, the aqueous ink containing a solubility altering agent; (c) washing the non-photosensitive layer with an aqueous solution to remove the soluble areas; and (d) converting the poly(amic acid) polymer to a polyimide.


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