The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 1997
Filed:
Apr. 24, 1996
Applicant:
Inventors:
Hung-Sheng Chen, San Jose, CA (US);
Tim Nguyen, Milpitas, CA (US);
Larry Moberly, Santa Clara, CA (US);
Chih S Teng, San Jose, CA (US);
Assignee:
National Semiconductor Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 51 ; 437195 ; 437978 ;
Abstract
The overetching that occurs during the formation of contact openings in a substantially planarized layer of insulation material is substantially reduced by changing the thickness of the insulation material that is formed over the top conductive structure of a semiconductor device, and by forming the openings to the top conductive structure during the fabrication of a second metal layer rather than during the formation of a first metal layer.