The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 1997
Filed:
May. 05, 1994
Applicant:
Inventors:
Linda S Plano, Redwood City, CA (US);
Michael G Peters, Santa Clara, CA (US);
Kramadhati V Ravi, Atherton, CA (US);
John M Pinneo, Redwood City, CA (US);
Assignee:
Crystallume, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; H05H / ;
U.S. Cl.
CPC ...
427249 ; 427577 ; 427255 ; 4272551 ; 427122 ; 423446 ;
Abstract
A continuous thin diamond film having a thickness of less than about 2 microns has a low leakage. The thin diamond film may be supported on a supporting grid and may be incorporated into an X-ray window. The film may be formed in a DC assisted CVD process where in a first phase a relatively high concentration of a carbonaceous gas is introduced into the reactor and in a second phase the concentration of the carbonaceous gas is reduced to a lower value.