The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1997
Filed:
Jul. 28, 1995
Donald Umstadter, Ann Arbor, MI (US);
Jonathan Workman, Ann Arbor, MI (US);
Anatoly Maksimchuk, Ann Arbor, MI (US);
Xinbing Liu, Ann Arbor, MI (US);
The Regents of the University of Michigan, Ann Arbor, MI (US);
Abstract
The present invention provides a system and an apparatus to produce x-rays from plasmas by focusing an intense, short duration optical pulse from a laser onto a target. The concentrated energy contained in the focused laser beam ionizes the target material, raising it to a temperature at which ions are produced in a chain reaction ionization, and x-rays are emitted when ions become de-excited (their electrons change energy level) or free electrons recombine with the ions in the plasma. The method comprises controlling pulse time duration of x-rays emitted from a plasma-forming target by generating a beam of one or more laser pulses; adjusting the intensity of the laser pulse to obtain a desired intensity incident at a surface of the plasma-forming target matter; directing the laser pulse onto the surface of the plasma-forming matter to generate the x-rays having a pulse duration which changes in proportion to a change in the incident laser pulse intensity. In one embodiment, the x-rays are then directed onto a sample target.