The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1997
Filed:
Apr. 03, 1995
Papu D Maniar, Austin, TX (US);
Arkalgud R Sitaram, Austin, TX (US);
Motorola Inc., Schaumburg, IL (US);
Abstract
Self-aligned silicide regions (24) are formed in a semiconductor device (10) using vapor phase reaction. A chemical vapor deposition system (40) is used, but rather than depositing a blanket silicide material, a precursor (48) is introduced into the reaction chamber (42) and reacts with only exposed silicon and polysilicon members of the device. The reaction is assisted by heating the substrate to a temperature at which the precursor is volatile. Because the precursor source reacts only with exposed silicon and polysilicon regions, subsequent etch steps are unnecessary. In one form, cobalt silicide regions are formed using a cobalt carbonyl as the precursor source.