The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1997
Filed:
Feb. 17, 1995
Thomas Margaria, Chedde, FR;
Pechiney Electrormetallurgie, Courbevoie, FR;
Abstract
A metallurgical silicon with controlled microstructure for the preparation of halogenosilanes, characterized by an image of the microstructure obtained with the scanning electron microscope which is processed by binarization between an intermetallic phase and a silicon matrix, with expansion in zones corresponding to the intermetallic phase with an extension of about 10 .mu.m around these zones. The ratio of the surface fraction of the intermetallic phase after expansion to the intermetallic phase before expansion, S/S.sub.0, is between 20 and 40. The silicon according to the invention assures an elevated reactivity in the Rochow reaction for the production of halogenosilanes intended for the preparation of silicones.