The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 1997
Filed:
Jul. 28, 1993
Applicant:
Inventor:
Lothar Stoll, Munich, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430322 ; 430323 ; 430324 ; 430325 ; 430326 ; 430394 ;
Abstract
A method for producing relief surface structures comprises the step of providing a photoresist layer having a relief surface structure on a surface of a substrate, the relief structure of the photoresist layer being like the surface relief structure desired on the substrate, then removing the photoresist layer with an erosion process that erodes both the photoresist layer as well as the substrate material which is free of the photoresist layer or becomes free of the photoresist layer. To obtain the relief surface structure in the photoresist layer, the layer can be exposed with different amounts of exposure and then developed to form the relief structure