The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 1997
Filed:
Jul. 14, 1994
Ralf Engelhardt, Uetze, DE;
Alfred Vogel, Lubeck, DE;
Medizinisches Laserzentrum Lubeck GmbH, Lubeck, DE;
Abstract
A method and apparatus for reducing unwanted pressure changes generated during treatment of a target material in a liquid-filled space with a laser. A pilot pulse is generated to produce a gas bubble in a region of the liquid-filled space before a processing pulse is directed through the region and onto the target material. An impulse spacing between the pilot pulse and the processing pulse is optimized by detecting an oscillation period of the gas bubble. The pilot pulse and processing pulse may be generated by the same or separate laser sources and directed toward the target material by the same or separate conductors, respectively.