The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 1997
Filed:
Sep. 01, 1993
Naohito Shiga, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A method for manufacturing an ion flow electrostatic recording head including: a plurality of first electrodes extending in parallel to one another on an insulating substrate; a plurality of second electrodes intersecting the plurality of first electrodes to form a matrix and having openings at positions corresponding intersections of the matrix; and a dielectric layer interposed between the plurality of first and second electrodes. The plurality of the first and second electrodes jointly constitute ion generating portions arranged in a matrix pattern. The method includes: (a) forming a conductive film on the dielectric layer which constitutes a multilayer structure on the insulating substrate together with the first electrodes; and applying a plating to the conductive film to form the plurality of second electrodes, the plating including applying a nickel chemical plating to the conductive film and applying an electroless plating thereto.