The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 1997
Filed:
Apr. 28, 1995
Daoshen Bi, Burlington, MA (US);
Maurice J Fitzgerald, Canton, MA (US);
Frederick R Kearney, Walpole, MA (US);
Rong-Chang Liang, Newton, MA (US);
William C Schwarzel, Billerica, MA (US);
Tung-Feng Yeh, Waltham, MA (US);
Polaroid Corporation, Cambridge, MA (US);
Abstract
The present invention provides a lithographic printing plate comprising a substrate and a photocurable polymeric photoresist, such as those based on free-radical initiated photocuring mechanisms. To constrain detrimental and undesired activity of excess free radicals, an embodiment of the printing plate is further provided with a free-radical regulating system. In a particular embodiment, the free-radical regulating system is provided as an overcoat, the overcoat being a light-transmissive overcoat and comprising a polymer having a pendant free-radical trapping group. A particular polymer for the overcoat has the formula ##STR1## wherein, m is from approximately 20% by weight to approximately 95% by weight, and n is from approximately 0% by weight to approximately 75% by weight. Capable of deactivating free-radicals actinically generated in the photoresist subsequent to exposure, the polymer is soluble in fountain or ink solution and incompatible with the photoresist.