The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 1997
Filed:
Apr. 18, 1995
Otto Albrecht, Atsugi, JP;
Hiroshi Matsuda, Isehara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An apparatus and process for producing organic monomolecular or multilayer films continuously comprises a tank having a spreading region (S) for spreading a material to form a monomolecular film, a compression region (C) for compressing the material on the liquid surface to form the monomolecular film and a deposition region (D) where the monomolecular film is deposited on a substrate. Means is provided to cause liquid to flow continuously from the spreading region to the deposition region through the compression region. A first control means is provided to maintain the liquid level in the deposition region D at a predetermined level. A second control means is provided for regulating the surface pressure of the monomolecular film at a predetermined value. Fluid flow through the apparatus is regulated so that the thickness of the liquid flow in the region C is less than thickness of the liquid flow in the regions S and D, and a decoupling region DS is provided between the region S and the region C. The provision of the decoupling region DS permits more stable film production.