The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 1997
Filed:
Dec. 30, 1994
Lynn Galarneau, Golden Valley, MN (US);
Daniel J Rogers, White Bear Lake, MN (US);
Honeywell Inc., Minneapolis, MN (US);
Abstract
The present invention discloses 1) a process for photopolymer replication on plastics, and 2) the scale-up step-and-repeat process in photopolymers. High fidelity optical element replication using a master optical element having submicron diffractive pattern feature sizes embossed into a UV curable photopolymer material for step-and-repeat 'tiling' replication of the master optical element to create light weight, low cost, large area diffractive optical elements (LADOE). Furthermore, by using a chrome mask to eliminate ridge formation around a single diffractive optic element extremely narrow seams result, thereby increasing the optical fidelity of the resulting LADOE. Accordingly, each LADOE made according to the present invention is characterized by having minimum seam widths between patterns of discrete diffractive optic elements that introduce negligible optical distortion to a viewer.