The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 1997
Filed:
Feb. 08, 1995
Alexander Altshuler, Pawtucket, RI (US);
Nobler Technologies, Inc., Avon, MA (US);
Abstract
A magnetron sputtering cathode assembly provides an annular target of sputtering material located with a sputtering surface facing a substrate to be sputtered. An inner magnet and an outer ring magnet are positioned adjacent inner and outer edges of the sputtering surface. The outer ring magnet is oriented so that its North-to-South magnetic orientation is substantially parallel to the plane defined by the sputtering surface while the inner magnet is oriented so that its North-to-South magnetic orientation is substantially perpendicular to the plane defined by the sputtering surface. A pair of walls extend at the inner and outer edges of the annular target away from the sputtering surface and toward the substrate. The walls and the magnets define a closed-loop array of radial magnetic lines having improved target erosion and plasma-containing characteristics.