The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 1997

Filed:

Jan. 25, 1996
Applicant:
Inventors:

Anthony J de Ruyter, San Diego, CA (US);

David W Means, Carlsbad, CA (US);

Assignee:

Cymer Laser Technologies, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 14 ; 372-9 ; 372107 ; 372108 ; 372109 ;
Abstract

A shutter mechanism having a slide element coupled to a support base by a plurality of roller bearings journaled between opposing pairs of guide rods is disclosed. The slide element and support base have corresponding beam apertures in alignment when the shutter is in its open position. Angularly mounted on the slide, adjacent to the slide's beam aperture, is a UV reflective mirror. When the shutter is commended to close, an actuator forces the slide and support base apertures out of alignment, while simultaneously positioning the UV reflective mirror into the position previously occupied by the slide's aperture. A laser beam, previously being transmitted through the aligned apertures, will be reflected by the mirror to a beam stop as a diagnostic instrument mounted on the support base.


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