The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1997
Filed:
Mar. 29, 1995
Petrus F Bongaerts, Waalre, NL;
Jacob Bruinink, Eindhoven, NL;
Adrianus L Burgmans, Eindhoven, NL;
Henri R Van Helleputte, Eindhoven, NL;
Babar A Khan, Ossining, NY (US);
Karel E Kuijk, Dommelen, NL;
Philips Electronics North America Corp., New York, NY (US);
Abstract
A method for making an electrical device such as a PALC display device, and the electrical device or PALC device so made, in which a channel plate is provided with substantially vertical side walls, and the electrodes are formed by a self-aligning anisotropic plasma etching process which requires no photolithography. A similar process may be used to form a fanout region for individual contacting of channel electrodes. For improved contacting, preferably the fanout region is also channelled and an upstanding structure such as columns provided in the fanout channels so that the spaces between the columns and between the columns and the side walls are filled up with deposited metal that remains following the anisotropic etching process.