The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 1997

Filed:

Nov. 08, 1993
Applicant:
Inventors:

Seshu B Desu, Blacksburg, VA (US);

Chien-Hsiung Peng, Blacksburg, VA (US);

Tian Shi, Beijing, CN;

Pradyot A Agaskar, Hopewell Township, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
4272481 ; 4272551 ; 4272552 ; 4272553 ; 528 31 ;
Abstract

The chemical vapor deposition of hydridospherosiloxane to generate films of SiO.sub.2 at low temperatures on substrates that cannot withstand high temperatures. The chemical vapor deposition process synthesized compounds with the general formula,


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