The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1997
Filed:
Jan. 17, 1995
Robert M Guidash, Rush, NY (US);
Herbert J Erhardt, Rochester, NY (US);
Eric G Stevens, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
This invention concerns a novel structure to create a low capacitance floating diffusion without changing or adding steps to the image sensor fabrication process. It consists of incorporation of a novel structure at the contact area between the floating diffusion and the gate electrode that reduces the junction capacitance of the floating diffusion and improves the sensitivity of the device (the structure features overlapping contact, gate, metalization and n-type regions which provide the electrical contact between the floating diffusion and the gate). Additionally, the structure has a low resistance diffusion region that is self aligned with a gate electrode.