The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1997
Filed:
Mar. 29, 1995
Applicant:
Inventors:
Hideki Komatsu, Tokyo, JP;
Shoji Nishio, Tokyo, JP;
Assignee:
Konica Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430399 ; 430448 ; 430264 ; 430611 ; 430613 ; 430488 ; 430963 ;
Abstract
A method of processing a photographic light-sensitive material comprising a backing layer on a support opposite an emulsion layer comprises the steps of exposing the material, developing the exposed material with developer, the developer being replenished with developer replenisher in an amount of not more than 200 ml per m.sup.2 of the material, and fixing the developed material,