The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1997
Filed:
Apr. 01, 1994
Ami Berkowitz, Del Mar, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A single layer film is deposited onto a substrate at room temperature from two sources, one source being a magnetic material, the other being a less-magnetic material. The film is annealed for predetermined times in order to induce phase separation between the magnetic clusters and the less-magnetic matrix, and to form stable clusters of a size such that each magnetic particle, or cluster, comprises a single domain and has no dimensions greater than the electron spin flip mean free path within the particle. The creation of two magnetic phases makes it possible to establish exchange coupling between the phases so that a relatively low saturation field is required to induce GMR.