The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1997
Filed:
Feb. 28, 1995
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; H05H / ; C30B / ;
U.S. Cl.
CPC ...
427563 ; 427574 ; 427572 ; 427553 ; 427554 ; 117 92 ; 117 99 ; 117103 ;
Abstract
A process for forming a deposited film comprises the steps of:
Quick Actions:
Hirai, Yutaka. (1997). Process for forming and etching a film to effect specific crystal growth (U.S. Patent No. 5591492). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5591492
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile