The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 1996
Filed:
May. 30, 1995
Jules D Levine, Dallas, TX (US);
Chi-Cheong Shen, Richardson, TX (US);
Robert Taylor, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
An electron emitter plate (110) for an FED image display has an extraction (gate) electrode (22) spaced by a dielectric insulating spacer (125) from a cathode electrode including a conductive mesh (18). Arrays (12) of microtips (14) are located in mesh spacings (16), within apertures (26) formed in clusters (23) in extraction electrode (22). Microtips (14) are deposited through the apertures (26). Apertures (26) are arranged in regular, periodic arrays (23, 23', 123, 123') defining lattices having occupied apertured positions and internal unapertured vacancy positions (150, 150'). The insulating spacer (125) is etched to undercut electrode (22) to connect apertured lattice positions, forming a common cavity (141) for microtips (14) within each mesh spacing (16), and leaving central posts (143) at the unapertured vacancies (150, 150'). The etch-out reduces the dielectric constant factor of gate-to-cathode capacitance in the finished structure. Placing posts at vacancy positions enables gate support over the cavity without sacrificing high microtip density.