The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 1996

Filed:

Dec. 02, 1992
Applicant:
Inventors:

Masahiko Takahashi, Fuji, JP;

Shusaku Tabata, Fuji, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430 18 ; 4302861 ; 430306 ; 430309 ; 4302841 ;
Abstract

A photosensitive resin composition for producing a relief printing plate is disclosed, which comprises a polymer selected from the group consisting of a prepolymer, a binder polymer and a mixture thereof, an ethylenically unsaturated monomer, a specific hindered amine and a photopolymerization initiator. Even when the photosensitive resin composition is excessively irradiated with strong actinic rays in order to cure the resin composition to its inner portion sufficiently, the surface of the resin composition does not undergo photodeterioration by virtue of the hindered amine contained therein, thereby imparting excellent toughness to the photocured resin composition throughout the entire thickness thereof. Thus, a relief printing plate having excellent printing resistance can be produced.


Find Patent Forward Citations

Takahashi, Masahiko. (1996). Photosensitive resin composition for producing a relief printing plate (U.S. Patent No. 5589306). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5589306

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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