The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 1996

Filed:

Feb. 05, 1993
Applicant:
Inventors:

Kevin P Gibbons, Sunnyvale, CA (US);

Louis C Lau, Alameda, CA (US);

Floyd E Woodard, Los Altos, CA (US);

Assignee:

Southwall Technologies Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; G02B / ; B32B / ; B32B / ;
U.S. Cl.
CPC ...
428626 ; 20419215 ; 20419216 ; 20419227 ; 359584 ; 359585 ; 359839 ; 428627 ; 428660 ; 428662 ; 428663 ; 428687 ; 428458 ; 428469 ; 428480 ; 4289122 ; 428913 ;
Abstract

The adhesion to plastic substrates of thick layers of functional metals having an oxide heat of formation that is greater than -40,000 calories/gram atom of metal, such as silver, copper, gold, and the like, is improved if a thin layer of a metal having an oxide heat of formation of less than -50,000 calories/gram atom of metal is present as an adhesion-promoting primer layer. When the primer layer metal has a melting point greater than 1100.degree. C., it should be present as the metal or as a substoichiometric oxide. When the primer layer metal has a melting point less than 1100.degree. C., it may be present as the metal, as a substoichiometric oxide, or as a full stoichiometric oxide. Processes for preparing these materials using sputter-depositing and reflectors incorporating these materials are also disclosed.


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