The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 1996

Filed:

Jan. 09, 1995
Applicant:
Inventors:

Catherine Ronge, Paris, FR;

Alain Mail, Draveil, FR;

Yves Marot, Buc, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
73 / ; 73 3103 ;
Abstract

A novel process for supplying a gas to an analyzer for measuring traces of impurities in the gas is provided. The process includes the steps of supplying the analyzer with: (i) a gas to be analyzed; (ii) a pure gas; and (iii) a standardizing gas obtained by dilution of one or more impurities in the pure gas as follows: (A) dividing a flow of pure gas into a set of at least first and second bypass lines, arranged in parallel, each of the bypass lines having an entry including a calibrated restriction, the flow of pure gas into the set of bypass lines being regulated by a flow regulator placed upstream of the set, (B) charging the pure gas of the first bypass line with a predetermined quantity of at least one impurity to obtain, after dilution with the pure gas of the second bypass line, a flow of the standardizing gas, which is directed from an exit of the set of bypass lines towards the analyzer along a feed line.


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