The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 1996

Filed:

Sep. 13, 1994
Applicant:
Inventors:

Susumu Miyazaki, Kitasouma-gun, JP;

Tsuyoshi Nakano, Funabashi, JP;

Nobuya Niizaki, Yokohama, JP;

Junichi Yasukawa, Chigasaki, JP;

Miki Matsumura, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-7 ; 430 20 ; 430293 ; 430394 ;
Abstract

There is provided a method of forming a micro-patterned functional film with a high precision on a substrate comprising:


Find Patent Forward Citations

Miyazaki, Susumu. (1996). Method of forming a functional film (U.S. Patent No. 5587260). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5587260

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…