The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1996
Filed:
Jun. 16, 1994
Joseph L Cecchi, Albuquerque, NM (US);
James E Stevens, Albuquerque, NM (US);
Princeton University, Princeton, NJ (US);
Abstract
A high density elongated plasma is produced by the interaction of an electrically conductive planar antenna located outside of a processing chamber, and a magnetic field generating means, also located outside of the processing chamber. A magnetic field perpendicular to the plane of the antenna is generated within the processing chamber by the magnetic field generating means. The antenna is electrically coupled to a radio frequency power source to generate a helicon wave in the processing chamber to produce a plasma of a gas in the processing chamber. The magnetic field generated by the magnetic field generating means elongates the plasma within the processing chamber.