The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 1996
Filed:
Aug. 03, 1994
Toshiro Tahara, Kanagawa-ken, JP;
Yukio Sugita, Kanagawa-ken, JP;
Youichi Kimura, Kanagawa-ken, JP;
Kazuo Shiota, Kanagawa-ken, JP;
Haruyoshi Kuriyama, Kanagawa-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa-ken, JP;
Abstract
In a photosensitive material processing apparatus, a photosensitive material taking on the form of a long strip is fed into a conveyance mechanism and conveyed in this form along a predetermined conveyance path. An exposure device, a reservoir section, a development processing section, and a cutter are located in the conveyance path. The exposure device carries out scanning exposing operations on the long strip of the photosensitive material and thereby forms latent images on the long strip of the photosensitive material. In the reservoir section, a looped portion for serving as a buffer for conveyance is formed in the long strip of the photosensitive material, on which the latent images have been formed. In the development processing section, development processing is carried out on the long strip of the photosensitive material, which is fed via the reservoir section. The cutter cuts the long strip of the photosensitive material, which has been subjected to the development processing, into sheets having a predetermined length.