The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 1996

Filed:

May. 25, 1995
Applicant:
Inventors:

Mitsuhiro Kurosawa, Tokyo, JP;

Masayuki Kurematsu, Tokyo, JP;

Takehiro Itoga, Tokyo, JP;

Hiroyuki Hashimoto, Tokyo, JP;

Mina Sato, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
396622 ; 396641 ;
Abstract

A photosensitive material processing machine for processing a photosensitive material with a processing solution. The machine includes: a processing rack for forming a conveyance path of the photosensitive material in the processing solution; a conveyance roller, which is disposed in the processing rack, for conveying the photosensitive material; a sheet-shaped guide member for slidablly supporting the photosensitive material, in which the guide member is disposed in the processing rack so that the surface faces to the circumferential surface of the conveyance roller; a guide support member, which is disposed at the upper portion or the bottom portion of the processing rack, for supporting the guide member; and a driving means for driving the conveyance roller. In such the machine, the photosensitive material is conveyed by the conveyance roller as the photosensitive material being nipped between the conveyance roller and the guide member.


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