The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 1996

Filed:

May. 03, 1995
Applicant:
Inventors:

Katsu Saito, Saitama, JP;

Tetsuzo Kuragano, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
395141 ;
Abstract

The present invention relates to a free-from surface creation method and apparatus thereof which can automatically determine such internal control points that allow a plurality of patches to form a smooth surface. Based on the four normal lines (N.sub.00, N.sub.01, N.sub.10, N.sub.11) to a quadrilateral patch A at its corners and on its four edges (E.sub.1, E.sub.2, E.sub.3, E.sub.4), reference normal lines at a plurality of points defined on each edge (E.sub.1, E.sub.2, E.sub.3, E.sub.4) are determined, and each reference normal line determined on the respective plurality of points are approximated to the normal line corresponding to the plurality of points which are defined on the edges of which are shared with the quadrilateral patch A and the adjacent patch. Therefore, the internal control points of the quadrilateral patch A are determined.


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