The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 1996
Filed:
Sep. 12, 1994
Jean-Marc Moret, Cortaillod, CH;
Philippe Renaud, St-Sulpice, CH;
Felix Rudolf, St-Blaise, CH;
Raymond Vuilleumier, Fontainemelon, CH;
CSEM Centre Suisse d'Electronique et de Microtechnique SA, Neuchatel, CH;
Abstract
The obturators can be actuated in order to modulate an incident beam (L). Microshutters (5) are attached to a substrate by means of fastenings opposing resistance to their rotation away from a rest position. The microshutters (5) are placed on optical paths (X--X) so as to be able to interrupt them or establish them. They are fitted out with reflecting surfaces (7) so as to deflect the light when they are in the blocking position. On each optical path (X--X) a supplementary reflecting surface (8), a diaphragm (6) and a focusing means (4) are placed. Thus, in line with its position, each microshutter can focus the light on the diaphragm (6) so as to allow it to pass or to deflect it in order to block it. The application thereof is in the transformation of a beam (L) into a modulated beam (Lm).