The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1996
Filed:
Oct. 21, 1988
Wei-yu Wu, Calabasas, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
An electrochemical method is disclosed for selectively etching either n-type or p-type semiconductor material in the presence of the other type. A liquid electrolyte is prepared in which the etching reaction is based on hole transport. In selectively etching p-type material the holes are provided by the dopant concentration and the process is carried out in the dark to prevent the etching of n-type layers. Conversely, selective etching of n-type material is done in the presence of light and with p-type material effectively out of the current path. In a preferred embodiment of a method of selectively etching a doping superlattice n-i-p-i structure composed of alternating p-type and n-type GaAs layers, C.sub.6 H.sub.2 (OH).sub.2 (SO.sub.3 Na).sub.2 .cndot.H.sub.2 O is used as the electrolyte. Selectively etching first the p-type layers at one end of the structure and then the n-type layers at the other end, digitate edge patterns are etched to which ohmic contacts can be applied. The invention also encompasses selectively etched structures which can be used to fabricate various kinds of electro-optic devices, such as optical modulators and photodetectors.