The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1996
Filed:
Nov. 10, 1994
Hiroyuki Yamamoto, Tenri, JP;
Yukio Kurata, Tenri, JP;
Keiji Sakai, Nara, JP;
Yoshio Yoshida, Nara, JP;
Kuniaki Okada, Tenri, JP;
Kouji Minami, Gose, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A method for producing a tapered waveguide layer is disclosed. The method includes the steps of: forming a resist pattern on a substrate; setting the substrate in an apparatus for forming a film such that particles constituting the film reach the substrate from a direction which is oblique relative to the substrate; forming the film on a region of a surface of the substrate which is not covered by the resist pattern, the film having a thickness distribution corresponding to a shadow which the resist pattern creates on the substrate in accordance with an angle between the substrate and the direction; and removing the resist pattern, thereby forming the tapered waveguide layer consisting of the film on the substrate.