The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1996
Filed:
Mar. 10, 1995
Masaji Nishikawa, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A processing method based on resist pattern formation, includes the steps of forming an electrostatic latent image on a photosensitive rotating drum, forming a toner image on the drum by developing the electrostatic latent image with a hot-melt toner, transferring the toner image on the drum onto a processing target member made of a material that is dissolved by an etchant, in accordance with hot-melt transfer, and processing the processing target member based on the toner image thereon as a resist pattern. The processing step has an etching step of causing the etchant to act on a surface of the processing target member on which the resist pattern has been transferred, thereby selectively etching the surface of the processing target member.