The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 1996

Filed:

Jan. 17, 1996
Applicant:
Inventors:

James R Lutz, Round Lake Beach, IL (US);

Keith D Alsberg, Chicago, IL (US);

James F Caruso, Evanston, IL (US);

Paul J Doczy, Chicago, IL (US);

Robert S Gelick, Evanston, IL (US);

Craig S Scherer, Wilmette, IL (US);

Assignee:

Johnson Worldwide Associates, Sturtevant, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A62B / ; A62B / ; B63C / ;
U.S. Cl.
CPC ...
12820118 ; 12820127 ; 12820623 ; 12820111 ;
Abstract

The present invention is directed to a pressure equalization system for use in a dive mask of the type used for scuba diving and skin diving. The dive mask generally includes a frame in which a substantially transparent window or lens is mounted. A flexible skirt is also attached to the frame and includes a nosepiece configured to fit over the nose of the diver. An equalizer system includes a pair of buttons disposed to cooperate with the sidewalls of the nosepiece. The diver can simply press the buttons towards one another to seal his or her nose when equalizing internal and external pressure.


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