The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1996
Filed:
Aug. 10, 1994
Didier Judas, Paris, FR;
Jean-Marc Sage, Oullins, FR;
Elf Atochem S.A., , FR;
Abstract
Polyetheresteramides, characterized in that they comprise both of the following repeating entities: ##STR1## in which X represents the residue of a polyamide-diacid oligomer with an Mn of between 300 and 8000, Y represents the residue of a polyetherdiol with an Mn of between 200 and 5000, and Z represents the residue of a polyetherdiamine with an Mn of between 200 and 5000, wherein the proportion by mass of the entities Z resulting from the condensation of the polyetherdiamine with respect to the total amount of the entities resulting from the polyetherdiol and polyetherdiamine, i.e. Z/(Z+Y), is between 1 and 50%. The polyetheresteramides according to the invention can be used as is and are suitable for the production of mouldings, extrudates, films, sheaths, or composite materials such as multi-layer film. They can also be mixed with other polymers and in particular with polyamides. Additives such as heat stabilizers, antioxidizing agents, dyes, inorganic fillers, or various organics can also be added to them.