The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1996
Filed:
Jun. 21, 1994
Kenichi Kodama, Kanagawa, JP;
Kensuke Goda, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
An apparatus for exposing photosensitive materials includes a plurality of light sources for generating beams having different wavelengths, a polygon mirror for scanning and exposing the beams toward a color photosensitive material, and one or more f.theta. lenses disposed on an optical path between the photosensitive material and the polygon mirror. The polygon mirror and the f.theta. lenses are arranged, with respect to the beam from a light source having an intermediate wavelength among the light sources, such that reflection points corresponding to both ends of beam scanning on reflection surfaces of the polygon mirror pass through an identical point on an optical axis of the f.theta. lenses, and light beams at the both ends of beam scanning have line symmetry with respect to the optical axis of the f.theta. lenses.