The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 1996
Filed:
Oct. 26, 1993
Yusuke Yajima, Kokubunji, JP;
Yoshio Takahashi, Kunitechi, JP;
Masakazu Ichikawa, Tokyo, JP;
Shigeyuki Hosoki, Hachioji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An apparatus for measuring an electromagnetic field distribution using a focused electron beam can measure the electromagnetic field distribution in a specimen with high resolution and high reliability. A focused electron beam radiation system irradiates a specimen with a focused electron beam. A specimen tilt mechanism tilts a specimen by 180.degree. about a tilt axis that is perpendicular to the optical axis of the focused electron beam. An electron beam position detector measures the direction and quantity of the deflection given to the focused electron beam when it is transmitted through the specimen. Further, a processing system calculates the direction and the intensity of an electric field, and the direction and the intensity of a magnetic field separately at a point on the specimen through which the focused electron beam is transmitted, from the data on the direction and the quantity of the deflection of the focused electron beam measured by the electron beam position detector before and after the turnover of the specimen by the specimen tilt mechanism. Thus, an electric field and a magnetic field in a specimen can be separately observed independently of each other.