The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 1996
Filed:
Dec. 12, 1994
Kenji Nakamura, Amagasaki, JP;
Taizo Hara, Amagasaki, JP;
Hideo Katoh, Amagasaki, JP;
Shinji Satomura, Amagasaki, JP;
Wako Pure Chemical Industries, Ltd., Osaka, JP;
Abstract
This invention is intended to provide a process by which a complex formed by the interaction between one or more analytes to be measured and affinity substance can be more effectively separated from substances existing together therewith which tend to affect the detection of the complex, for example, free affinity substance, by using high pressure liquid chromatography (HPLC); and a process for measuring a trace component by utilizing said separating process. This invention is characterized in that a substance which has been modified with a substance capable of changing properties of the complex (a separation-improving substance) and has affinity for the complex is attached to the complex. Because of this characteristic, the invention is effective in that the position of elution of said complex in the HPLC can be freely controlled. Furthermore, it is markedly effective in that the process for measuring a trace component by utilizing the separating process of this invention makes it possible to carry out the measurement with higher precision as compared with conventional measuring processes using HPLC.