The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1996
Filed:
Sep. 28, 1994
Kouichi Soneda, Kumagaya, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
An exposure apparatus for exposing a resist film coated on the inner surface of a face panel in a color cathode-ray tube through a shadow mask with a number of apertures apparatus comprises an exposure light source having an optical axis coaxial with an axis of the face panel, for radiating a light beam onto the inner surface of the face panel through the shadow mask. A discontinuous lens is arranged between the exposure light source and the shadow mask to be rotatable about the optical axis. The discontinuous lens has first and second regions arranged adjacent to one another in the direction of rotation of the discontinuous lens. A light beam from the exposure light source is guided by means of the first and second regions to the shadow mask along different paths. The lens is rotated by a drive motor so that the light beam from the light source passes through each of the apertures along two different paths.