The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1996
Filed:
Apr. 13, 1995
Peter L Balzer, Chenango Forks, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of aligning an image at a desired position on a substrate support including providing a radiation source producing desired wavelengths of radiation. A fluorescing medium is provided on a substrate support. The radiation is directed toward the substrate support. At least one filter is positioned between the radiation source and the substrate support. A mask is positioned between the radiation source and the substrate support. The mask selectively transmits the radiation. The substrate support is irradiated with the radiation, thereby causing the fluorescing medium to fluoresce. A position of the radiation impacting upon the substrate support is detected with at least one detector by detecting an image of the fluorescing medium. A signal corresponding to the detected position of the radiation is produced. The detected position of the radiation is compared with a desired position of radiation impinging upon the substrate support to determine whether a deviation of the position of the radiation on the substrate support away from a desired position in a direction perpendicular to the radiation exists. A signal corresponding to comparison is produced. If a deviation exists, the position of the radiation source, the mask and the substrate support are altered relative to each other in accordance with the signal in the direction perpendicular to the radiation so as to cause the position of the radiation on the substrate support to substantially correspond to the desired position.