The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1996
Filed:
Apr. 21, 1994
Klaus Korner, Schoneiche, DE;
Fritz Holger, Berlin, DE;
Lajos Nyarsik, Berlin, DE;
Gunter Spur, Berlin, DE;
Eckart Uhlmann, Berlin, DE;
Abstract
A method and apparatus for topographic surface analysis including at least ne light source for radiating light, a first light-distributing surface of a first diffraction grating for receiving light from the at least one light source and for reflecting a first bundle of light under normal optical conditions and a second bundle of light formed by diffraction of the first order. A first optical stage is provided for projecting the first and second bundles from the first light-distributing surface in an optically conjugated form onto an object surface to be analyzed of a sample. Light representing the object surface is sharply projected via the first optical stage onto a second light-distributing surface of a second diffraction grating. A second optical stage projects diffracted bundles of light from the second light-distributing surface onto a detector which detects radiation and enables topographic analysis of the object surface.