The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1996
Filed:
May. 18, 1995
Applicant:
Inventor:
Masahide Hirama, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430394 ; 430312 ; 430396 ;
Abstract
When semiconductor devices having patterns with different repetition counts of repetition patterns are to be manufactured, a mask having a unit pattern for forming the repetition patterns is used, and photolithographic patterning processes in which the numbers of times of exposure are different from each other are used. For this reason, the number of masks can be reduced, and the masks can be formed at low cost. In addition, risk in manufacturing the semiconductor devices is decreased.
Hirama, Masahide. (1996). Method of manufacturing semiconductor devices (U.S. Patent No. 5567575). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5567575
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile