The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 1996

Filed:

May. 09, 1994
Applicant:
Inventors:

Lixiong Li, Austin, TX (US);

Earnest F Gloyna, Austin, TX (US);

Jacqueline K McKendry, Houston, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
585700 ; 585733 ;
Abstract

Production of alkanes from an alkyl bound to a heteroatom under controlled hydrothermal conditions at supercritical or near critical water conditions including the use of an additive. The method reduces the extent of oxidation, generates useful and recoverable products, alters product distributions, promotes product yield, and enhances reaction rates. Additives alter product distributions and neutralize or consume mineral acids.


Find Patent Forward Citations

Li, Lixiong. (1996). Controlled hydrothermal processing (U.S. Patent No. 5565616). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5565616

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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