The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1996
Filed:
Jan. 30, 1995
Lev M Sorokin, Moscow, RU;
Plasma Plus, Van Nuys, CA (US);
Abstract
A method for making metastable compounds of Me metal, argon and hydrogen, comprising the steps of generating a high frequency plasma discharge in a flow of hydrogen-argon gas mixture, the plasma discharge having a higher temperature plasma generating active region and producing a flow of plasma downstream of the plasma discharge; establishing a zone of substantially zero axial flow of the mixture within the active region of the plasma discharge relative to the flow of plasma immediately downstream of the generating means; introducing finely powdered Me metal into or near the zone and within the active region at a rate conducive to evaporation of the metal in the plasma discharge; rapidly cooling the reaction products resulting from interaction of the Me metal with the plasma to precipitate a solid component; and passivating the surface of the solid component.