The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 1996

Filed:

Apr. 10, 1995
Applicant:
Inventors:

Kenji Okada, Suita, JP;

Kiyoshi Morimoto, Neyagawa, JP;

Masaharu Udagawa, Shibuya-ku, JP;

Koichiro Yuki, Neyagawa, JP;

Masaaki Niwa, Hirakata, JP;

Yoshihiko Hirai, Osaka, JP;

Juro Yasui, Toyonaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; H01L / ;
U.S. Cl.
CPC ...
1566511 ; 15666111 ; 257 14 ; 257 23 ; 437228 ;
Abstract

A quantum device including a plate-like conductor part having a necking portion and a method of producing the same are disclosed. The method includes the steps of forming a first mask layer having a first strip portion on a conductor substrate; forming a second mask layer having a second strip portion on the conductor substrate; etching a region of the conductor substrate which is not covered with the first and second mask layers, by using the first and second mask layers as an etching mask, to form a plurality of first recess portions on a surface of the conductor substrate; selectively covering side faces of the plurality of first recess portions, and side faces of the first and second mask layers with a side wall film; selectively removing only the second mask layer, the first mask layer and the side wall film being left unremoved; etching another region of the conductor substrate which is not covered with the first mask layer and the side wall film, by using the first mask layer and the side wall film as an etching mask, to form a plurality of second recess portions on the surface of the conductor substrate; selectively removing part of another region of the surface of the conductor substrate which is not covered with the first mask layer and the side wall film; and removing the first mask layer and the side wall film, to form the plate-like conductor part having the necking portion at the conductor substrate.


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