The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 1996

Filed:

Jan. 17, 1995
Applicant:
Inventors:

Naoyuki Hashimoto, Hirakata, JP;

Sakae Kobayashi, Hirakata, JP;

Youichi Nakamura, Katano, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F24F / ;
U.S. Cl.
CPC ...
454187 ; 454140 ; 454230 ;
Abstract

A clean space system prevents pollution of clean surroundings in a processing space. Pollution is avoided which could otherwise occur when a worker comes in contact with the processing space while carrying out processes and operations in the clean surroundings. The apparatus includes a clean processing space, in which the processes and operations are carried out, and a preparing space coupled with an opening for work in the processing space. The preparing space is used by the worker prior to entering the processing space. In the preparing space, the worker performs preliminary actions such as changing his clothes and cleaning himself using an air shower to remove particles from his body.


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