The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 1996

Filed:

Jul. 12, 1993
Applicant:
Inventors:

Steven C Knowles, Seattle, WA (US);

Alan E Kull, Seattle, WA (US);

George W Butler, Seattle, WA (US);

David O King, Woodinville, WA (US);

Assignee:

Olin Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
1187 / ; 118715 ; 1187 / ; 1187 / ; 1187 / ; 423446 ; 20429841 ; 2191215 ; 21912151 ; 21912152 ;
Abstract

There is provided a system for the manufacture of a diamond film. A plasma generator generates a hydrogen atom containing plasma stream into which a hydrocarbon containing gas is fed. The plasma dissociates the hydrocarbon to carbon radicals and carbon which are deposited on a substrate where the carbon crystallizes to a diamond film. The efficiency of the system is increased by heating the hydrogen source gas prior to generation of the plasma. Other means to increase the effectiveness of the system include using a plurality of plasma streams and shaping the plasma stream, A low internal strain, high quality optical film is generated by depositing the carbon on a substrate supported by a heat sink having nonuniform thermal conductivity such that the thermal gradient across the surface of the heat sink is less than about 8.degree. C./centimeter.


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