The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 1996
Filed:
Jul. 01, 1994
Joyce R Merritt, Fairfield, OH (US);
Mark T Lund, West Chester, OH (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
The present invention provides an improved atomization system for dispensing and atomizing a fluid product having film-forming characteristics. The atomization system includes a nozzle for atomizing the fluid product which has been formed of a reduced wettability composition including a base material and a wettability-reducing component for reducing the wettability of the base material with the fluid product. The reduced-wettability attribute ensures that the product will tend to 'bead up' on the surfaces of the nozzle assembly rather than wetting or coating the surfaces. The surfaces will thus tend to repel the product, once the supply pressure driving the fluid toward the nozzle is relieved, leaving the critical nozzle surfaces substantially free of a film of product which would tend to dry and form a residue on the critical nozzle surfaces when exposed to atmospheric air. The reduced wettability of the nozzle assembly is preferably achieved through the addition of a melt additive to impart the desired characteristics to the nozzle base material. Improved atomizer nozzles according to the present invention also preferably incorporate a change in cross-sectional area of the nozzle passages to further enhance the migration of the fluid away from the nozzle orifice once the supply pressure is relieved utilizing capillary pressure phenomena.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile