The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1996
Filed:
Feb. 24, 1995
Applicant:
Inventor:
Hiroyoshi Tanabe, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 71 ; 355 53 ; 355 77 ;
Abstract
An exposure system includes at least an illuminating system for irradiating a linearly polarized illumination light on a mask with a predetermined pattern and a mounting system on which a wafer is placed, the wafer is provided thereon with a resist film, wherein further provision is made of an element for controlling a polarization direction of the light at a p-polarization direction at least when the light is irradiated on a sloped or vertical portion of the wafer.